Studies of Cr/Al2O3 interfacial reactions

Journal of Physics and Chemistry of Solids

Volumn 58, Issue 2, 1997, Pages 257-270

  Lu, Hua ^a   Bao, C L ^a   Shen, D H ^a   Qin, J ^a   Cui, Y D ^a   Wang, Y X ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

A. ceramics; A. interfaces; C. photoelectron spectroscopy

Indexed keywords

ALUMINA; ALUMINUM; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CERAMIC MATERIALS; CHEMICAL REACTIONS; CHROMIUM; CHROMIUM ALLOYS; COMPOSITION EFFECTS; THERMAL EFFECTS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM OXIDE; SURFACE OXYGEN ANIONS; SURFACE SENSITIVE TECHNIQUES; ULTRA HIGH VACUUM (UHV);

INTERFACES (MATERIALS);

EID: 0031078747     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(96)00127-8     Document Type: Article

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