Preparation of TiNi ferroelastic-ferroelectric thin film heterostructures

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 393-398

  Alam, M R ^a   Kumar, Ashok ^a   Shu, N ^a   Chan, H L ^a   You, Q ^a  

^a University of South Alabama   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM TITANATE; DEPOSITION; FERROELECTRIC MATERIALS; HETEROJUNCTIONS; LEAD COMPOUNDS; PULSED LASER APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; SHAPE MEMORY EFFECT; SUBSTRATES; TITANIUM ALLOYS; X RAY DIFFRACTION ANALYSIS;

BUFFER LAYER; FERROELASTIC MATERIALS; SILICON SUBSTRATES;

MAGNETIC THIN FILMS;

EID: 0031078459     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00756-8     Document Type: Article

References (6)

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3. C.A. Rogers, J. Intell. Mater. Syst. Struct. 4 (1993) 4.
4. A. Kumar, U. Ekanayake, D. Kjendal, N. Shu, R.B. Inturi and J.A. Banard, in: Proc. Symp. on High Temperature Coatings II, TMS Annual Meeting, Anaheim, CA, Feb. 4-8, 1996 (1996) p. 349.
5. A. Kumar, N. Shu, U. Ekanayake, D. Kjendal and G. Wattuhewa, Int. Symp. on Manufacturing Practices and Technologies, American Ceramic Society Spring Meeting, New Orleans, LA, Nov. 5-8, 1995.
6. N. Shu, MS Thesis, Department of Electrical Engineering, University of South Alabama (1996).