Optical properties of InP epilayers grown on (111)B GaP substrates by metalorganic chemical vapor deposition

Solid State Communications

Volumn 101, Issue 8, 1997, Pages 585-589

  Derbali, M B ^a   Meddeb, J ^a   Maaref H ^a   Abraham, P ^b  

^a FACULTÉ DES SCIENCES DE MONASTIR   (Tunisia)

^b UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROJUNCTIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR GROWTH; STRAIN; SUBSTRATES; SURFACE PROPERTIES;

ANTIPHASE DOMAIN; GALLIUM PHOSPHIDE; LOW TEMPERATURE PHOTOLUMINESCENCE; PHOTOLUMINESCENCE EXCITATION;

EPITAXIAL GROWTH;

EID: 0031078023     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(96)00661-8     Document Type: Article

References (17)

1. Onabe, K., Jpn. J. Appl. Phys., 21, 1982, 797.
2. Yamamoto, A., Yamaguchi, M. and Uemura, C., Appl. Phys. Lett., 44, 1984, 611.
3. Horikawa, H., Ogawa, Y., Kawai, Y. and Sakuta, M., Appl. Phys. Lett., 55, 1988, 397.
4. Kimura, T., Ishimura, E., Uesugi, F., Tsugumi, M., Mizugushi, K. and Murotani, T., J. Crysal Growth, 107, 1991, 827.
5. Olego, D.J., Okuno, Y. and Kawano, T., J. Appl. Phys., 71, 1992, 4492.
6. Wuu, D.S., Horng, R.H., Huang, K.C. and Lee, M.K., Appl. Phys. Lett., 54, 1989, 236.
7. Wuu, D.S., Tung, H.H., Horng, R.H. and Lee, M.K., J. Appl. Phys., 65, 1989, 1213.
8. Hansen, K., Pleiner, E., Tang, G.P., Bartels, A. and Schlachetzki, A., J. Appl. Phys., 76, 1994, 470.
9. Smith, D.L., Solid State Commun., 57, 1986, 919.
10. Hou, H.Q. and Tu, C.W., Appl. Phys. Lett., 62, 1993, 281.
11. Hou, H.Q. and Tu, C.W., J. Crysal Growth, 127, 1993, 199.
12. Hickernell, F.S. and Gayton, W.R., J. Appl. Phys., 37, 1966, 462.
13. Camassel, J., Merle, P., Bayo, L. and Mathieu, H., Phys. Rev., B22, 1980, 2020.
14. Dean, P.J. and Skolnick, M.S., J. Appl. Phys., 54, 1983, 346.
15. Bose, S.S., Szafranek, I., Kim, M.H. and Stilman, G.E., Appl. Phys. Lett., 56, 1990, 752.
16. Rosseto, G., Franzheld, R., Camporese, A., Favaro, M.L., Torzo, G., Ajò, D. and Zanella, P., J. Crysal Growth, 146, 1995, 511.
17. Tran, C.A., Masut, R.A., Cova, P., Brener, J.L. and Leonelli, R., J. Crysal Growth, 121, 1992, 365.