Conical electromagnetic radiation in the Kretschmann attenuated total reflections configuration

Applied Optics

Volumn 36, Issue 4, 1997, Pages 841-846

  Kim, Yung Kyu ^a,c   Auvil, P R ^a   Ketterson, J B ^a,b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Department of Electrical Engineering and Computer Science ^*  (United States)

^c MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; ELECTROMAGNETIC WAVE SCATTERING; LIGHT INTERFERENCE; METALLIC FILMS; MICROSCOPES; PLASMAS; PRISMS; SILVER; SURFACE ROUGHNESS;

CONICAL ELECTROMAGNETIC RADIATION; KRETSCHMANN ATTENUATED TOTAL REFLECTION; SCANNING PLASMON OPTICAL MICROSCOPE; SURFACE PLASMONS;

ELECTROMAGNETIC WAVE POLARIZATION;

EID: 0031076612     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.000841     Document Type: Article

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