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Volumn 5, Issue 2, 1997, Pages 24-25
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One company's approach to semiconductor equipment parts cleaning: CO2
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON DIOXIDE;
CONTAMINATION;
ETCHING;
HAZARDOUS MATERIALS;
IMPURITIES;
INDUSTRIAL WASTE DISPOSAL;
PARTICLES (PARTICULATE MATTER);
POLYMERS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
SURFACE CLEANING;
VAPORS;
CARBON DIOXIDE CLEANING;
DRY ICE;
EQUIPMENT CLEANLINESS;
HAZARDOUS WASTE REDUCTION;
PELLET BLASTING;
SEMICONDUCTOR FABRICATION EQUIPMENT;
CHEMICAL CLEANING;
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EID: 0031076063
PISSN: 10686037
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (2)
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References (0)
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