Diamond growth with CF4 addition in hot-filament chemical vapour deposition

Journal of Materials Science

Volumn 32, Issue 4, 1997, Pages 941-947

  Corat, E J ^a   Trava Airoldi, V J ^a   Leite, N F ^a   Nono, M C A ^a   Baranauskas, V ^b  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DISSOCIATION; FILM GROWTH; MASS SPECTROMETRY; METHANE; NUCLEATION; RAMAN SPECTROSCOPY; SUBSTRATES; THERMAL EFFECTS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION; TETRAFLUOROMETHANE;

DIAMOND FILMS;

EID: 0031075633     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018557817955     Document Type: Article

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