Potentiometric investigation of silicon electrode immersed in alkaline hydrogen peroxide solution containing trace level of iron

Journal of the Electrochemical Society

Volumn 144, Issue 2, 1997, Pages

  Chyan, Oliver M R ^a,b   Chen, Jin Jian ^a   Chen, Ligang ^a,b   Xu, Fei ^a,b  

^a UNIVERSITY OF NORTH TEXAS   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; ELECTRIC VARIABLES MEASUREMENT; HYDROGEN PEROXIDE; IMPURITIES; IRON; SILICON WAFERS; SOLUTIONS;

IRON IMPURITIES; OPEN CIRCUIT POTENTIAL; OPEN CIRCUIT POTENTIAL MEASUREMENT; SILICON ELECTRODE;

ELECTROCHEMICAL ELECTRODES;

EID: 0031075528     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837418     Document Type: Article

References (12)

1. (a) W.Kern, RCA Rev., 31, 207, 234 (1970); ibid, 32, 64 (1971);
2. (a) W.Kern, RCA Rev., 31, 207, 234 (1970); ibid, 32, 64 (1971);
3. (b) Handbook of Semiconductor Wafer Cleaning Technology, W. Kern, Editor, Noyes Publications, Park Ridge, NJ (1993).
4. M. Miyazaki, S. Miyazaki, T. Kitamura, T. Aoki, Y. Nakashima, M. Houtai, and T. Shigematsu, Jpn. J. Appl. Phys., 34, 409 (1995).
5. P. J. Ward, This Journal, 129, 2573 (1982).
6. W. B. Henley, L. Jastrzebski, and N. F. Haddad, Mater. Res. Soc. Symp. Proc., 315, 299 (1993).
7. (a) O. M. R. Chyan, J. J. Chen, H. Y. Chien, L. Hall, and J. Sees, in Proceedings of the Second International Symposium on Ultra-clean Processing of Silicon Surfaces, p. 213, Brugge, Belgium (1994)
8. (b) O. M. R. Chyan, J. J. Chen, H. Y. Chien, J. Sees, and L. Hall, This Journal, 143, 92 (1996)
9. (c) O. M. R. Chyan, J. J. Chen, H. Y. Chien, J. J. Wu, M. Liu, J. Sees, and L. Hall, ibid., 143, L235 (1996).
10. (a) J. M. Delarios, C. R. Helms, D. B. Kao, and B. E. Deal, Appl. Surf. Sci., 30, 17 (1987)
11. (b) M. Morita. T. Ohmi, E. Hasegawa, M. Kawakami, and M. Ohwada, J. Appl. Phys., 68, 1272 (1990).
12. C. R. Helms and H. Park, in Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, J. Ruzyllo and R. E. Novak, Editors, PV 94-7, p. 26, The Electrochemical Society Proceedings Series, Pennington, NJ (1994).