Ultraviolet induced mechanisms in oxide film formation

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 538-543

  Boyd, Ian W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; EXCIMER LASERS; FILM GROWTH; LASER APPLICATIONS; LIGHT EMISSION; OXIDES; SEMICONDUCTING SILICON; SURFACE TREATMENT; ULTRAVIOLET LAMPS;

DIELECTRIC BARRIER DISCHARGES; OXIDE FILM FORMATION;

FILM PREPARATION;

EID: 0031075104     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00631-9     Document Type: Article

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