Fabrication methods for high aspect ratio microstructures

Journal of Intelligent Material Systems and Structures

Volumn 8, Issue 2, 1997, Pages 173-176

  Watanabe, Satori ^a   Esashi, Masayoshi ^a   Yamashita, Yoshio ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b SORTEC Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRYING; ELECTROPLATING; EVAPORATION; OXYGEN; PLASTIC MOLDS; POLYIMIDES; REACTIVE ION ETCHING; SURFACE TENSION; X RAY LITHOGRAPHY;

PATTERN COLLAPSE;

MICROSTRUCTURE;

EID: 0031074868     PISSN: 1045389X     EISSN: None     Source Type: Journal    
DOI: 10.1177/1045389X9700800207     Document Type: Article

References (6)

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2. Mohr, J., M. Kohl and W. Menz. 1993. "Micro Optical Switching by Electrostatic Linear Actuators with Large Displacements", Proc. of Transducers '93, pp. 120-123.
3. 2RIE and Electroplating", Proc. of Micro System Technologies '94, 143-152.
4. Putty, M. W. and K. Najafi. 1994. "A Micromachined Vibrating Ring Gyroscope". Proc. of 1994 Solid-Slate Sensor and Actuator Workshop, pp. 213-220.
5. Smith, H. I. et al. 1988. "X-Ray Microscopy", Springer Series in Optical Science, 43:58-61.
6. Tanaka, T., M. Morigami and N. Atoda. 1993. "Mechanism of Resist Pattern Collapse", J. of Electrochemical Society, 140(7):L115-L116.