Gel formation theory approach for the modelling of negative chemically amplified e-beam resists

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 157-160

  Patsis, G ^a   Raptis, I ^a   Glezos, N ^a   Argitis, P ^a   Hatzakis, M ^a   Aidinis, C J ^b   Gentili, M ^c   Maggiora, R ^c  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF ATHENS   (Greece)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; COMPOSITION; DIFFUSION; GELS; MODELS; PHOTORESISTS; SEMICONDUCTING POLYMERS;

ACID DIFFUSION; CHEMICALLY AMPLIFIED RESIST; GEL FORMATION; PHOTOACID GENERATOR; POST EXPOSURE BAKE; THERMAL PROCESSING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031074688     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00178-5     Document Type: Article

References (10)

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