Pattern generation for the next millennium

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 501-507

  Hawryliw, Andre ^a  

^a Newark Road North ^*  (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; MASKS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

OPTICAL LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; PATTERN GENERATION; RASTER SCANNED ELECTRON BEAM SYSTEMS; STEPPED REDUCTION RETICLES;

PHOTOLITHOGRAPHY;

EID: 0031074379     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00196-7     Document Type: Article

References (16)

1. Semiconductor Industry Association, Workshop: Working Group Reports 1993, pp.35-45.
2. 14th Annual Symposium on Photomask Technology and Management, 14-16 September 1994, Session 8.
3. "Wafer Requirements in the Year 2000", K H Brown. SPIE -BACUS Symposium, September 1994
4. "INTERFACE" Microlithography Seminars, Annual Proceedings, 1993-1996, from OCG.
5. "64 to 256 Megabit Reticle Generation", Ed. G Hearn. SPIE Review, Vol CR51.
6. "EBES: A Practical Electron Lithographic System", D Herriott et al, IEEE Trans.ED, 22, July 1975.
7. "EL-3: High Resolution E-Beam Lithography Tool". RD Moore et al. J. Vac. Sci. Technol. 19, p-950, 1981.
8. "EBES-4: A New Electron Exposure System", DS Alles et al, J. Vac. Sci. Technol. B, 5, p-47, 1987.
9. Jenoptik ZBA-31, now marketed by Leica Lithography Systems, Cambridge, UK.
10. For example, C Schomburg et al in these conference proceedings.
11. "The Use of Grey scale for Improved Raster Display of Vectors and Characters", F Crow, Computer Graphics, 12(3), p1-5, (1978).
12. "CORE-2564 Technical Overview", ETEC Systems, Beaverton, OR 97005, USA.
13. "Managing Lithography Errors", ML Rieger & JA Schoeffel, Solid State Tech. 32, p-151, (1989).
14. "Microcircuit Engineering", Ed. Ahmed & Nixon, Cambridge University Press (1980).
15. "Proximity Effect Correction for Electron Beam Lithography by Equalisation of the Background Dose", G Owen & P Rissmann, J.Appl. Phys. 54, p-3573, (1983).
16. "Hierarchy Optimisation", C Kalus et al, JJAP 34, p-6631, (1995).