Fabrication of 10-nm Si pillars with self-formed etching masks

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 293-296

  Tada, Tetsuya ^a,b   Kanayama, Toshihiko ^a,b   Weibel, Pascal ^c   Carrol, Simon J ^c   Seeger, Katrin ^c   Palmer, Richard ^c  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; MASKS; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA ETCHING; SILVER;

NANOSCALE ETCHING MASKS; SILICON NANOPILLARS;

SEMICONDUCTING SILICON;

EID: 0031072682     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00129-3     Document Type: Article

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