Fabrication of site-controlled metal dot array by electron beam surface modification

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 245-248

  Tsutsui, K ^a   Uejima, K ^a   Kawasaki, K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ARSENIC; ATOMS; CALCIUM COMPOUNDS; ELECTRON BEAMS; FABRICATION; INTERFACES (MATERIALS); SEMICONDUCTING GALLIUM; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE TREATMENT; THIN FILMS;

CALCIUM FLUORIDE; ELECTRON BEAM SURFACE MODIFICATION; GALLIUM DROPLET;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0031072579     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00104-9     Document Type: Article

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