Improvement of sputtering target utilization using dynamic plasma processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 2, 1997, Pages 884-888

  Harada, Hiroshi ^a   Kamatani, Yoshito ^a   Hirata, Akira ^a   Koyanagi, Tsuyoshi ^b  

^a UBE INDUSTRIES LTD   (Japan)

^b YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

Finite element method; ITO films; Magnetron sputtering; Target utilization

Indexed keywords

INDIUM TIN OXIDE FILMS; MAGNETRON SPUTTERING CATHODES; TARGET EROSION;

CATHODES; FINITE ELEMENT METHOD; MAGNETIC FIELDS; PLASMAS; SEMICONDUCTING TIN COMPOUNDS; SOLENOIDS; SPUTTER DEPOSITION; TARGETS; THIN FILMS;

MAGNETRON SPUTTERING;

EID: 0031072466     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.884     Document Type: Article

References (5)

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5. Denjiba Kaiseki no tameno Yugen Yoso-ho (Finite Element Method for Analysis of Electro-Magnetic Field), ed. Y. Yamamoto (Torikeppuse, Tokyo, 1986) [in Japanese).