High focal depth imaging by Beam Shaping Optical Elements?

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 205-208

  Hild, R ^a   Escalera, J C ^b   Yzuel, M J ^b   Nitzsche, G ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; MASKS; OPTICAL FILTERS; PROJECTION SYSTEMS;

BEAM SHAPING OPTICAL ELEMENT; GAUSSIAN RING; HIGH LOCAL DEPTH IMAGING; MODULATION TRANSFER FUNCTION; PHASE SHIFTING MASK; PHOTOLITHOGRAPHIC PROJECTION SYSTEM;

PHOTOLITHOGRAPHY;

EID: 0031072171     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00126-8     Document Type: Article

References (8)

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4. Mc. Cutchen, JOSA 54 (1964), 240-244
5. J. Campos, J. C. Escalera, R. Hild, G. Nitzsche, M.J. Yzuel, Microelectr. Engin.30(1996), 103-106
6. M.J. Yzuel, R. Hild, J. Campos, J.C. Escalera; Europto (SPIE) Glasgow, May 1996
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8. B. Salik, J. Rosen, A. Yariv, J. Opt. Soc. Am. A, 12 (1995), 1702-1706