Low temperature synthesis of diamond films in thermoassisted RF plasma chemical vapor deposition. II

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 2, 1997, Pages 792-797

  Watanabe, Ichiro ^a   Yoshie, Koushin ^a,b  

^a KANAZAWA UNIVERSITY   (Japan)

^b INTEC Inc   (Japan)

Author keywords

Diamond film; Electron spin resonance; Fluorine; Fluorocarbon; Low temperature growth; Radio frequency

Indexed keywords

EXTERNAL HEATING; PLASMA CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; FILM GROWTH; FLUOROCARBONS; IMPEDANCE MATCHING (ELECTRIC); INFRARED HEATING; LOW TEMPERATURE PROPERTIES; PARAMAGNETIC RESONANCE; PLASMAS; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

DIAMOND FILMS;

EID: 0031071645     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.792     Document Type: Article

References (24)

1. B. V. Spitsyn, L. L. Bouilov and B. V. Derjaguin: J. Cryst. Growth 52 (1981) 219.
2. S. Matsumoto, Y. Sato, M. Kamo and N. Setaka: Jpn. J. Appl. Phys. 21 (1982) L183.
3. M. Kamo, Y. Sato, S. Matsumoto and N. Setaka: J. Cryst. Growth 62 (1983) 642.
4. R. J. Koba: Diamond Film and Coatings, ed. R. F. Davis (Noycs Publications, Park Ridge, New Jersey, 1993) p. 147.
5. I. Watanabe, T. Matsushita and K. Sasahara: Jpn. J. Appl. Phys. 31 (1992) 1428.
6. S. Matsumoto: J. Mater. Sci. Lett. 4 (1985) 600.
7. R. A. Rudder, G. C. Hudson, J. B. Posthill, R. E. Thomas, R. C. Hendry, D. P. Malta, R. J. Markunas, T. P. Humphreys and R. J. Nemanich: Appl. Phys. Lett. 60 (1992) 329.
8. S. R. Lee and B. Gallois: Diamond & Relat. Mater, l (1992) 235.
9. Y. Shimada, N. Mutsukura and Y. Machi: J. Appl. Phys. 71 (1992) 4019.
10. J. Beckman, R. B. Jackman and J. S. Foord: Diamond & Relat. Mater. 3 (1994) 602.
11. R. B. Jackman and J. Beckman: Appl. Phys. Lett. 66 (1995) 1018.
12. Y. Muranaka, H. Yamashita and H. Miyadera: Diamond & Relat. Mater. 3 (1994) 313.
13. I. Watanabe and Ken Sugata: Jpn. J. Appl. Phys. 27 (1988) 1397.
14. M. Fanciulli and T. D. Moustakas: Diamond & Relat. Mater, l (1992) 773.
15. K. Fabisiak, M.Maar-Stumm and E.Blank: Diamond &; Relat. Mater. 2 (1993) 722.
16. Y. Matsui, A. Yuuki, M. Sahara and Y. Hirose: Jpn. J. Appl. Phys. 28 (1989) 1718.
17. D. E. Patterson, B. J. Bai, C. J. Chu, R. H. Hauge and J. L. Margrave: Proc. 2nd. Int. Conf. on New Diamond Science and Technology (Material Research Society, Pittsburgh, 1991) p. 433.
18. M. S. Wong and C. H. Wu: Diamond & Relat. Mater. 1 (1992) 369.
19. R. A. Rudder, G. C. Hudson, J. B. Posthill, R. E. Thomas and R. J. Markunas: Appl. Phys. Lett. 59 (1991) 791.
20. M. Kadono, T. Inoue, A. Miyanaga and S. Yamazaki: Appl. Phys. Lett. 61 (1992) 772.
21. H. Maeda, M. Irie, T. Hino, K. Kusakabe, S. Morooka: Diamond & Relat. Mater. 3 (1994) 1072.
22. D. E. Rosner and J. P. Strakey: J. Phys. Chem. 77 (1973) 690.
23. T. Ando, K. Yamamoto, M. Matsuzawa, Y. Takamatsu, S. Kawasaki, F. Okino, H. Touhara, M. Kamo and Y. Sato: Diamond & Relat. Mater. 5 (1996) 1021.
24. T. I. Hukka, R. E. Rawles and M. P. D'Evelyn: Thin Solid Films 225 (1993) 212.