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Volumn 35, Issue 1-4, 1997, Pages 177-183
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200nm deep-UV lithography using step-and-scan
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
EXCIMER LASERS;
LASER APPLICATIONS;
PERFORMANCE;
PHOTOLITHOGRAPHY;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
DEEP ULTRAVIOLET;
ELECTRICAL PROBE TECHNIQUE;
LINEWIDTH CONTROL;
QUADRUPOLE ILLUMINATION;
STEP AND SCAN SYSTEM;
PHOTORESISTS;
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EID: 0031071210
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(96)00089-5 Document Type: Article |
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Times cited : (5)
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References (0)
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