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Volumn 89, Issue 1-2, 1997, Pages 90-96

Surface and near surface structure and composition of high-dose implanted and electron beam annealed single crystal copper

(9) Pogrebnjak, A D a Duvanov, S M a Mikhaliov, A D a Lavrentiev, V I a Stayko, V V a Markov, A V b Ivanov, Yu F b Rotstein, V P b Proskurovsky, D I b

a SUMY STATE UNIVERSITY (Ukraine)

b INSTITUTE OF HIGH CURRENT ELECTRONICS (Russian Federation)

Author keywords

Annealing; Carbide; Copper; Implantation; Profile; Structure

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL ORIENTATION; DISLOCATIONS (CRYSTALS); ELECTRON BEAMS; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACE STRUCTURE; TITANIUM CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

HIGH CURRENT ELECTRON BEAM ANNEALING (HCEB); NUCLEAR REACTION ELASTIC RESONANCE (NRER);

COPPER;

EID: 0031071208 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(96)02933-7 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.