Structural properties of oxygenated amorphous cadmium telluride thin films

Thin Solid Films

Volumn 295, Issue 1-2, 1997, Pages 131-136

  El Azhari, M Y ^a   Azizan, M ^a   Bennouna, A ^a   Outzourhit, A ^a   Ameziane, E L ^a   Brunel, M ^b  

^a FACULTÉ DES SCIENCES SEMLALIA   (Morocco)

^b LABORATOIRE DE CRISTALLOGRAPHIE   (France)

Author keywords

Cadmium telluride; Oxidation; Surface roughness; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; COMPOSITION EFFECTS; FILM PREPARATION; OXIDATION; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; PROTECTIVE ATMOSPHERES; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CADMIUM TELLURIDE; DIODE RADIOFREQUENCY SPUTTERING; NITROGEN PARTIAL PRESSURE;

SEMICONDUCTING CADMIUM COMPOUNDS;

EID: 0031070549     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09276-0     Document Type: Article

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