Quantum wire self-ordered growth seeded by electron-beam lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 269-272

  Dwir, B ^a   Reinhardt, F ^a   Wehman, H ^a   Gustafsson, A ^a   Kapon, E ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOTECHNOLOGY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR QUANTUM DOTS; SEMICONDUCTOR QUANTUM WIRES; SUBSTRATES;

OPTICAL LITHOGRAPHY; SELF ORDERED GROWTH; V GROOVE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031070211     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00101-3     Document Type: Article

References (4)

1. A. Forchel et al., in Phys. & tech. of Submic. Struc., Springer-Verlag 1988.
2. J. M. Gérard et al., Mat. Sci. Eng. B37,8 (1996).
3. A. Gustafsson et al., APL 67, 3673 (1995).
4. D. Oberli et al., Nouv. Cim. 17D, 1641 (1995).