X-ray photoelectron spectroscopy depth profiling of aluminium nitride thin films

Surface and Interface Analysis

Volumn 25, Issue 2, 1997, Pages 99-104

  Butcher, K S A ^a   Tansley, T L ^a   Li, Xin ^a  

^a MACQUARIE UNIVERSITY   (Australia)

Author keywords

Aluminium nitride; Angle resolved XPS; Depth profiling; Valence band

Indexed keywords

ALUMINUM NITRIDE THIN FILMS; ARGON ION MILLING; ULTRAHIGH VACUUM ANALYSIS; VALENCE BAND MEASUREMENTS;

ALUMINUM COMPOUNDS; HYDROLYSIS; OXYGEN; SEMICONDUCTING SILICON; SUBSTRATES; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 0031070010     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1096-9918(199702)25:2<99::aid-sia212>3.0.co;2-u     Document Type: Article

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