Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 341-344

  Steingruber R ^a   Hamacher, M ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DRY ETCHING; ELECTRON DEVICE MANUFACTURE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE STRUCTURES; WAVEGUIDES;

FILTER GRATINGS; INTERFACE WAVEGUIDE GRATING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031069435     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00092-5     Document Type: Article

References (4)

1. H. Heidrich et al. Progress and prospects towards coherent receiver frontend OEICs, Proc. European Conference on Integrated Optics (ECIO), Neuchâtel, CH, (1993), pp 2-17.
2. R. Kaiser et al. Integration of a tunable 4-section DBR laser within polarization diversity heterodyne receiver PICs, Conf. Digest. Int. Semiconductor Laser Conference. '94, Maui, USA, (1994), p. 30.
3. L. Blum et al. A study of the key processing variables on the lithographic performance of Microposit SAL601-ER7 resist. J. Vac. Sci. Technology, Nov/Dec 1988, pp.2280-2285.
4. J. Barrier et al. Patterning of 0.1 μm polysilicon lines by using a negative electron beam resist. Microcircuit Engineering 1989, pp. 121-124.