A one-dimensional demonstration of spatial-phase-locked electron-beam lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 473-476

  Goodberlet, J ^a   Silverman, S ^b   Ferrera, J ^a   Mondol, M ^a   Schattenburg, M L ^a   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Revise Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DETECTORS; ELECTRIC VARIABLES MEASUREMENT; FILMS; MICROELECTRONIC PROCESSING; PHOTORESISTS; SIGNAL DETECTION; SUBSTRATES;

PHASE LOCKED ELECTRON BEAM LITHOGRAPHY; PHASE LOCKING; SECONDARY ELECTRON SIGNALS; SIGNAL QUALITY; SPATIAL PHASE LOCKING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031069433     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00188-8     Document Type: Article

References (4)

1. Henry I. Smith, Scott D. Hector, M. L. Schattenburg, and Erik H. Anderson, J. Vac. Sci. Technol. B, Vol. 9, No. 6 (1991) 2992.
2. Juan Ferrera, Vincent V. Wong, S. Rishton, V. Boegli, E. H. Anderson, D. P. Kern, and Henry I. Smith, J. Vac. Sci. Technol. B, Vol. 11, No. 6 (1993) 2342.
3. Vincent V. Wong, Juan Ferrera, J. N. Damask, J. M. Carter, Euclid I. Moon, H. A. Haus, Henry I. Smith and Stephen Rishton, J. Vac. Sci. Technol. B, Vol. 12, No. 6 (1994) 3741.
4. P. Horowitz and W. Hill, The Art of Electronics, Cambridge University Press, 32 East 57th Street, New York, NY 10022, p. 429.