Exchange anisotropy of CrNx/FeNy/CrNx trilayer thin films prepared by reactive sputtering

Materials Transactions, JIM

Volumn 38, Issue 2, 1997, Pages 91-98

  Tsuchiya, Yasuaki ^a,d   Kosuge, Koji ^a   Yamaguchi, Sadae ^b   Nakayama, Noriaki ^c  

^a KYOTO UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c YAMAGUCHI UNIVERSITY   (Japan)

^d NEC CORPORATION   (Japan)

Author keywords

Chromium nitride; Exchange coupling; Interface structure; Iron nitride; Magnetic anisotropy; Magnetization; Thin films

Indexed keywords

CHROMIUM COMPOUNDS; FILM PREPARATION; INTERFACES (MATERIALS); IRON COMPOUNDS; MAGNETIC ANISOTROPY; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; NITRIDES; SPUTTER DEPOSITION; STOICHIOMETRY; SURFACE STRUCTURE; THERMAL EFFECTS;

INTERFACE STRUCTURE; REACTIVE SPUTTERING; TRILAYER THIN FILMS;

MAGNETIC THIN FILMS;

EID: 0031069341     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.38.91     Document Type: Article

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