Use of infrared imagery in characterization of chemical vapor deposition reactors

Infrared Physics and Technology

Volumn 38, Issue 1, 1997, Pages 17-24

  Hyer, Paul V ^a  

^a NASA LANGLEY RESEARCH CENTER   (United States)

Author keywords

Chemical vapor deposition; Gas dynamics; Infrared; Photogrammetry

Indexed keywords

BOUNDARY CONDITIONS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FLOW PATTERNS; GAS DYNAMICS; HYDROGEN; NITROGEN; PHOTOGRAMMETRY;

THERMAL MAPS;

INFRARED IMAGING;

EID: 0031061873     PISSN: 13504495     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4495(96)00023-0     Document Type: Article

References (3)

1. W.D. Beyer, ed., CRC Standard Mathematical Tables, 27th Ed. (CRC Press, Boca Raton, FL, 1984) p. 199.
2. A.W. Burner, W.A. Snow and W.K. Goad, Proc. of the 51st Annual Meeting of the ASP, Vol. I (American Society of Photogrammetry, Falls Church, VA, 1985) pp. 62-77.
3. G. Dhatt and G. Touzot, The Finite Element Method Displayed (Wiley, New York, 1984) p. 102.