Determination of ultratrace amounts of metallic and chloride ion impurities in organic materials for microelectronics devices after a microwave digestion method

Analyst

Volumn 122, Issue 2, 1997, Pages 129-132

  Takenaka, Miyuki ^a   Kozuka, Shoji ^a   Hayashi, Masaru ^a   Endo, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Alkali fusion; Atomic absorption spectrometry; Chloride ion; Epoxy resin; Ion chromatography; Liquid crystal; Metallic impurity; Microwave digestion; Photoresist

Indexed keywords

CALCIUM ION; CHLORIDE ION; MAGNESIUM ION; POTASSIUM ION; SODIUM ION;

ARTICLE; ASSAY; ATOMIC ABSORPTION SPECTROMETRY; CONTAMINATION; ELECTRONICS INDUSTRY; ION PAIR CHROMATOGRAPHY; MICROWAVE RADIATION;

EID: 0031050769     PISSN: 00032654     EISSN: None     Source Type: Journal    
DOI: 10.1039/a604802a     Document Type: Article

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