Charged particle activation analysis of boron and carbon on the surface of silicon wafer

Journal of Radioanalytical and Nuclear Chemistry

Volumn 216, Issue 2, 1997, Pages 217-219

  Kataoka, S ^a   Tarumi, Y ^a   Yagi, H ^a   Tomiyoshi, S ^b   Nozaki, T ^c  

^a SHI Examination and Inspection Ltd   (Japan)

^b EHIME UNIVERSITY   (Japan)

^c WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CARBON; SILICON;

CHEMICAL ANALYSIS; CHEMICAL COMPOSITION; CONFERENCE PAPER; RADIATION DETECTION; RADIOCHEMISTRY; SURFACE PROPERTY;

EID: 0030979358     PISSN: 02365731     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02033781     Document Type: Conference Paper

References (7)

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