The sulfidation and oxidation behavior of sputter-deposited Al-Ta alloys at high temperatures

Corrosion Science

Volumn 39, Issue 1, 1997, Pages 59-76

  Mitsui, H ^a   Habazaku, H ^a   Hashimoto, K ^a   Mrowec, S ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

A. aluminium alloys; B. EDX; B. SEM; B. weight gain; B. XRD; C. oxidation; C. sulfidation

Indexed keywords

COMPOSITION EFFECTS; OXIDATION; OXIDATION RESISTANCE; PROTECTIVE COATINGS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SULFIDE CORROSION CRACKING; TANTALUM; THERMAL EFFECTS; X RAY DIFFRACTION;

ALUMINUM REFRACTORY METAL ALLOYS; PARABOLIC RATE LAW; PROTECTIVE INNER TANTALUM SULFIDE LAYER; RAPID OXIDATION; SULFIDATION; SULFIDATION RESISTANCE; WEIGHT GAIN;

ALUMINUM ALLOYS;

ALLOYS; OXIDATION;

EID: 0030887479     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0010-938X(96)00104-7     Document Type: Article

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