Refined approach to PCA-assisted Auger depth profile analysis

Surface and Interface Analysis

Volumn 25, Issue 1, 1997, Pages 5-9

  Schopke A ^a   Kelling, S ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Anger depth profile; Depth profile analysis; FeSix film; PCA

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CALCULATIONS; IRON ALLOYS; METALLIC FILMS; SILICON; STANDARDS; STOICHIOMETRY; SURFACES;

CHEMICAL BINDING STATE; DEPTH PROFILE ANALYSIS; IRON SILICON ALLOYS; PRINCIPAL COMPONENT ANALYSIS;

SPECTRUM ANALYSIS;

EID: 0030871525     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199701)25:1<5::AID-SIA197>3.0.CO;2-H     Document Type: Article

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