Quantitative analysis of iron dissolution during repassivation of freshly generated metallic surfaces

Journal of the Electrochemical Society

Volumn 144, Issue 1, 1997, Pages 64-72

  Itagaki, M ^a,c   Oltra, R ^a   Vuillemin, B ^a   Keddam, M ^b   Takenouti, H ^b  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b Université Pierre et Marie Curie   (France)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPUTER SIMULATION; DISSOLUTION; ELECTRIC CHARGE; ELECTROCHEMICAL ELECTRODES; IONS; IRON; MATHEMATICAL MODELS; MONOLAYERS; OXIDES; PULSED LASER APPLICATIONS; SULFURIC ACID;

CHANNEL FLOW DOUBLE ELECTRODE; ELECTRODE POTENTIAL; PULSED LASER DEPASSIVATION; REPASSIVATION; TRIVALENT OXIDE FILM;

PASSIVATION;

EID: 0030836938     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837366     Document Type: Article

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