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Volumn 70, Issue 4, 1997, Pages 408-410
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Cathodoluminescence study of GaAs quantum wells and of submicron dots fabricated by magnetron reactive ion etching
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Author keywords
[No Author keywords available]
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Indexed keywords
CALCULATIONS;
CATHODOLUMINESCENCE;
DIFFUSION;
ELECTRON BEAMS;
GOLD;
REACTIVE ION ETCHING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR QUANTUM DOTS;
ALUMINUM GALLIUM ARSENIDE;
CARRIER DIFFUSION LENGTH;
FEATURE SIZE EFFECTS;
SIDEWALL DAMAGE;
SURFACE RECOMBINATION VELOCITY;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 0030822402
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.119124 Document Type: Article |
Times cited : (9)
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References (12)
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