Automatic defect classification for semiconductor manufacturing

Machine Vision and Applications

Volumn 9, Issue 4, 1996, Pages 201-214

  Chou, Paul B ^a,b   Rao, A Ravishankar ^a,c,d,e   Sturzenbecker, Martin C ^a,f,g,h   Wu, Frederick Y ^a   Brecher, Virginia H ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF ROCHESTER   (United States)

^c INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^d UNIVERSITY OF MICHIGAN   (United States)

^e IEEE

^f DUKE UNIVERSITY   (United States)

^g LUCENT TECHNOLOGIES   (United States)

^h IBM   (United States)

Author keywords

Classification; Defects; Machine vision; Process control; Semiconductor manufacturing

Indexed keywords

COMPUTER INTEGRATED MANUFACTURING; DEFECTS; FACTORY AUTOMATION; INSPECTION; KNOWLEDGE BASED SYSTEMS; PARAMETER ESTIMATION; PATTERN RECOGNITION SYSTEMS; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SPATIAL VARIABLES MEASUREMENT;

AUTOMATED DEFECT CLASSIFICATION (ADC) SYSTEM; VISUAL DEFECT INSPECTION;

COMPUTER VISION;

EID: 0030816952     PISSN: 09328092     EISSN: None     Source Type: Journal    
DOI: 10.1007/s001380050041     Document Type: Article

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