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Volumn 33, Issue 3, 1997, Pages 248-250
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Quantum confined Stark effect in GaInAsSb/AlGaAsSb quantum wells grown by molecular beam epitaxy
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Author keywords
Molecular beam epitaxial growth; Optoelectronic devices; Semiconductor devices; Semiconductor materials
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Indexed keywords
CALCULATIONS;
ELECTRIC CURRENT MEASUREMENT;
EPITAXIAL GROWTH;
LEAKAGE CURRENTS;
MOLECULAR BEAM EPITAXY;
OPTOELECTRONIC DEVICES;
PHOTODIODES;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
SUBSTRATES;
HYDROGEN FLUORIDE;
QUANTUM CONFINED STARK EFFECT;
TARTARIC ACID;
TENSILE STRAIN;
WET CHEMICAL MESA ETCHING;
X RAY DIFFRACTION MEASUREMENT;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 0030813295
PISSN: 00135194
EISSN: None
Source Type: Journal
DOI: 10.1049/el:19970141 Document Type: Article |
Times cited : (6)
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References (7)
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