The reactive processing of silicides

JOM

Volumn 49, Issue 1, 1997, Pages 41-45

  Radhakrishnan, R ^a,b   Bhaduri, S ^a,b,c   Henager Jr , C H ^b,d,e  

^a UNIVERSITY OF IDAHO   (United States)

^b TMS   (United States)

^c STONY BROOK UNIVERSITY   (United States)

^d UNIVERSITY OF WASHINGTON   (United States)

^e PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMBUSTION; HIGH TEMPERATURE APPLICATIONS; MECHANICAL ALLOYING; SYNTHESIS (CHEMICAL);

COMBUSTION SYNTHESIS; DISPLACEMENT REACTIONS; PLASMA VAPOR DEPOSITION; SILICIDES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030787137     PISSN: 10474838     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf02914631     Document Type: Review

References (85)

1. A.K. Vasudevan and J.J. Petrovic, Mater. Sci. & Eng., A155 (1992), p. 1.
2. S.P. Murarka, Silicides for VLSI Applications (New York: Academic Press), 1983.
3. P.J. Mischter and D.S. Schwarte, JOM, 41 (11) (1989), pp, 52-55.
4. R. Rosenkranz, G. Frommeyer, and W. Smarsly, Mater. Sci. & Eng., A152 (1992), p. 288.
5. R.R. Rice, Ceram. Eng. Sci. Proc., 11 (1990), p. 1226.
6. R. Tiwari, H. Herman, and S. Sampath, High Temperature Ordered Intermetallic Alloys IV. ed. L.A. Johnson, D.P. Pope, and J.O. Stiegler (Pittsburgh, PA: MRS, 1991).
7. R.G. Castro et al., Scripta Met. Mater., 26 (1992), p. 207.
8. Y.L. Jeng, J. Wolfenstine, and E.J. Lavernia, Scripta Met. Mater., 28 (1993), p. 455.
9. R.A. Rapp, A. Ezis, and G.J. Yurek, Met. Trans. 4 (1973), p. 1283.
10. G.J. Yurek, R.A. Rapp, and J.P. Hirth, Met. Trans., 10A (1979), p 591.
11. C. Tangchitvittaya, J.P. Hirth, and R.A. Rapp, Met. Trans., 13A (1982), p. 585.
12. C.R. Kao, J. Woodford, and Y.A. Chang, Muter. Sci. & Eng., A195 (1995), p. 29.
13. C.H. Henager, Jr., J.L. Brimhall, and J.P. Hirth, Seripta Met. Mater., 26 (1992), p. 585.
14. C.H. Henager, Jr., J.L. Brimhall, and J.P. Hirth, Mater. Sci. & Eng., A155 (1992), p. 109.
15. C.H. Henager, Jr., and J.L. Brimhall, Scripta Met. Mater., 26 (1993), p. 1597.
16. C.H. Henager Jr., J.L. Brimhall, and L.N. Brush, Mater. Sci. & Eng., A195 (1995), p. 65.
17. C.C. Koch, Ann. Rev. Mater. Sci., 19 (1989), p. 121.
18. C. Suryanarayana, Bibliography on Mechanical Alloying and Milling, (Cambridge, U.K.: Cambridge International Science Publishing, 1995).
19. G. Le Caer et al., J. Mater. Sci., 25 (1990), p. 4726.
20. D.L. Zhang and T.B. Massalski, J. Mater. Res., 9 (1994), p. 53.
21. R.K. Viswanadham, S.K. Mannan, and S. Kumar, Seripta Met. Mater., 22 (1988), p. 1011.
22. K.S. Kumar and S.K. Mannan, High Temperature Ordered Intermelallic Alloys III, ed. CT. Liu et al. (Pittsburgh, PA: MRS, 1992), p. 415.
23. J. Kajuch, J.D. Rigney, and J.J. Lewandowski, Mater. Sci. & Eng., A155 (1992), p. 59.
24. J. Kajuch and K. Vedula, Advances in Powder Metallurgy, (1990), p. 187.
25. M. Atzmon, Solid State Powder Processing, ed. A.H. Clauer and J.J. Barbadillo (Warrendale, PA: TMS, 1990), p. 173.
26. S. Patankar, S-Q. Xiao, and J.J. Lewandowski, J. Mater. Res., 8 (1993), p. 1311.
27. E. Ma et al., J. Mater. Res., 8 (1993), p. 1836.
28. R.B. Schwarz et al., Mater. Sci. & Eng., A155 (1992), p. 75.
29. G.T. Fei et al., J. of Alloys and Compounds, 229 (1995), p. 280.
30. S. Jayashankar and M.J. Kaufman, J. Mater. Res., 8 (1993), p. 1428.
31. S. Jayashankar and M.J. Kaufman, Scripta Met. Mater., 26 (1992), p. 1245.
32. A. Calka et al., J. Mater. Sci. Lett., 10 (1991), p. 734.
33. K. Omura and H. Miura, Ami. Phys. Lett., 60 (1992), p. 1433.
34. K. Okadome, K. Unno, and T. Arakawa, J. Mater. Sci., 30 (1995), p. 1807.
35. A.G. Merzhanov and I.P. Borovinskaya, Combust. Sci. and Tech., 10 (1975), p. 195.
36. A.G. Merzhanov, Combustion and Plasma Synthesis of High Temperature Materials, ed. Z.A. Munir and J.B. Holt (New York: VCH, 1992), p. 1.
37. Z.A. Munir, Ceram. Bull., 67 (1988), p. 342.
38. Z. A. Munir and V. Anselmi-Tamburini, Mater. Sci. Rep., 3 (1989), p. 277.
39. S.B. Bhaduri, Z.B. Qian, and R. Radhakrishnan, Seripta Met. Mater., 30 (1994), p. 179.
40. A.R. Sarkisiyan et al., Comb. Expl. Shock Waves, 15 (1979), p. 310.
41. T.S. Azatyan et al., Comb. Expl. Shock Waves, 15 (1979), p. 35.
42. V.I. Itin et al., Sov. phy. Journal, 18 (1976), p. 408.
43. S.B. Bhaduri, R. Radhakrishnan, and S. Wojcicki, Advances in Powder Metallurgy, vol. 9, ed. J.M. Capus and R.M. German (Princeton, NJ: APMI, 1992) p. 369.
44. S.C. Deevi, Mater. Sci. and Eng., A149 (1992), p. 241.
45. S.C. Deevi, J. Mater. Sci., 26 (1991), p. 3343.
46. S. Zhang and Z.A. Munir, J. Mater. Sci, 26 (1991), p. 3685.
47. S.B. Bhaduri, R. Radhakrishnan, and Z.B. Qian, Scipta Met. Mater., 29 (1993), p. 1089.
48. J. Trambukis and Z.A. Munir, J. Am. Cer. Soc., 73 (1990), p. 1240.
49. A.K. Bhattacharya, J. Am. Cer. Soc, 74 (1991), p. 2707.
50. J. Subrahmanyam and R. Mohan Rao, J. Am. Cer. Soc, 78 (1995), p. 487.
51. J. Subrahmanyam and R. Mohan Rao, Mater. Sci. and Eng., A183 (1994), p. 205.
52. J.M. Brupbacher, L. Christodoulou, and D.C, Nagle, U.S. patent 4,710, 348 (187).
53. R.M. Aikin, Jr., Ceram. Eng. Sci. Proc., 12 (1991), p. 1643.
54. J. Cool et al., Eng. Sci. Proc, 12 (1991), p. 1656.
55. E.W. Lee et al., JOM, 43 (3) (1991), pp. 54-57.
56. S. Gedavanishviili and Z.A. Munir, Seripta Met. Mater., 31 (1994), p. 741.
57. A. Feng and Z.A. Munir, J. Appl. Phys., 76 (1994), p. 1927.
58. I.J. Shon and Z.A. Munir, Mater. Sci. and Eng., A202 (1995), p. 256.
59. D.A. Hardwick, R.L. Martin, and R.J. Moores, Scripta Met. Mater., 27 (1992), p. 391.
60. P.S. DeCarli and J.C. Jamison, Science, 133 (1961), p. 1821.
61. N.N. Thadhani, J. Appl. Phys., 76 (1994), p. 2129.
62. E. Dunbar et al., Proc. AIRAPT/APS High Pressure Science and Technology Conference, ed. S.C. Schmidt (New York: AIP Press, 1994).
63. M.A. Meyers et al., Mater. Sci and Eng., A201 (1995), p. 150.
64. L.H. Yu and M.A. Meyers, J. Mater. Sci., 26 (1991), p. 601.
65. K.S. Vecchio, L.H. Yu, and M. A. Meyers, Acta Met. Mater., 42 (1994), p. 701.
66. M.A. Meyers, L.H. Yu, and K.S. Veechio, Acta Met. Mater, 42 (1994), p. 715.
67. S.C. Deevi and N.N. Thadhani, Mater. Sci. and Eng., A192/ 193 (1995), p. 604.
68. B.R. Krueger, A.H. Muntz, and T. Vreeland, Jr., Met. Trans. A, 23A (1992), p. 55.
69. N.N. Thadhani, private communication.
70. E. Dunbar, N.N. Hadhani, and R. A. Graham, J. Mater. Sci., 28 (1993), p. 2903.
71. H.O. Pierson, Handbook of Chemical Vapor Deposition (New Jersey: Noyes Publications, 1992).
72. A. Sherman, Chemical Vapor Deposition for Microelectronics - Principles, Technology and Applications (New Jersey: Noyes Publications, 1992).
73. W.S. Cheng and C. Y. Lee, J. Mater. Sci. Lett., 13 (1994), p. 1204.
74. G.J. Reynolds, G.B. Cooper III, and P.J. Gaczi, J. Appl. Phys., 65 (1989), p. 3212.
75. K. Saito et al., J. Electrochem. Soc., 141 (1994), p. 1879.
76. S. Inoue et al., J. Electrochem. Soc., 130 (1983), p. 1603.
77. S.G. Telford et al., Appl. Phys. Lett., 62 (1993), p. 1766.
78. D. Dobkin et al., J. Ekctrochem. Soc., 137 (1990), p. 1623.
79. R.S. Nowicki et al., J. Vac. Sci. and Tech., A9 (1991), p. 1073.
80. K. Saito et al., J. Electochem. Soc., 141 (1993), p. 513.
81. K. Saito, T. Amazawa, and Y. Arita, Jap. J of Appl. Phys., 29 (1990), p. L185.
82. S. McClatchie, H. Thomas, and D. V. Morgan, Appl. Surf. Sci., 73 (1993), p. 58.
83. T. Hara, T. Miyamoto, and T. Yokoyama, J. Electrochem. Soc., 136 (1989), p. 1177.
84. T. Hara et al., J. Electrochem. Soc., 137 (1990), p. 2955.
85. S.G. Telford et al., J. Electrochem. Soc., 140 (1993), p. 3689.