In situ plume-emission monitoring during pulsed-laser deposition of YBa2Cu3O7-δ and yttria-stabilized zirconia thin films

Review of Scientific Instruments

Volumn 68, Issue 1, 1997, Pages 170-177

  Göres, Jörn ^a,b,c   Kung, Pang Jen ^a   Fenner, D B ^a,d   Budnick, J I ^b  

^a AFR Inc   (United States)

^b UNIVERSITY OF CONNECTICUT   (United States)

^c UNIVERSITY OF HEIDELBERG   (Germany)

^d Fenner Engineering Associates   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; DEPOSITION; DIFFRACTION GRATINGS; OXYGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SILICON WAFERS; SPECTROMETERS; STOICHIOMETRY; SUPERCONDUCTING FILMS; YTTRIUM COMPOUNDS; ZIRCONIA;

FIBER OPTIC TRANSFER; LASER ENERGY DENSITY; PULSED LASER DEPOSITION; YTTRIUM BARIUM COPPER OXIDE;

EMISSION SPECTROSCOPY;

EID: 0030784236     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147803     Document Type: Article

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