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Volumn 78, Issue 4, 1997, Pages 697-700

Activation volume for hf diffusion in an amorphous Ni0.54Zr0.46alloy

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS MATERIALS; CALCULATIONS; HAFNIUM; MATHEMATICAL MODELS; NICKEL ALLOYS; POINT DEFECTS; PRESSURE; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030783280     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.78.697     Document Type: Article
Times cited : (35)

References (25)
  • 13
    • 84909777035 scopus 로고
    • University of Illinois
    • H. M. Wu, Ph.D. thesis, University of Illinois, 1991.
    • (1991) Ph.D. Thesis
    • Wu, H.M.1
  • 25
    • 0029243128 scopus 로고
    • G. Rummel, et al., Z. Metall. 86, 131 (1995).
    • (1995) Z. Metall , vol.86 , pp. 131
    • Rummel, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.