Lasing in neonlike sulphur and silicon

Optics Communications

Volumn 133, Issue 1-6, 1997, Pages 196-200

  Li, Yuelin ^a,b   Lu, Peixiang ^a,b   Pretzler, Georg ^a   Fill, Ernst E ^a  

^a MAX PLANCK INSTITUT FÜR QUANTENOPTIK   (Germany)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSITIONS; SILICON; SULFUR; X RAY LASERS;

ASTERIX IODINE LASER; LASING;

LASER APPLICATIONS;

EID: 0030782890     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(96)00438-5     Document Type: Article

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