Redox-active ferrocenyl dendrimers: Thermodynamics and kinetics of adsorption, in-situ electrochemical quartz crystal microbalance study of the redox process and tapping mode AFM imaging

Journal of the American Chemical Society

Volumn 119, Issue 44, 1997, Pages 10763-10773

  Takada, Kazutake ^a   Díaz, Diego J ^a   Abruña, Hector D ^a   Cuadrado, Isabel ^b   Casado, Carmen ^b   Alonso, Beatriz ^b   Morán, Moisés ^b   Losada, José ^b  

^a Department of Molecular Biology and Genetics   (United States)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DENDRIMER; SILICON DIOXIDE;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; KINETICS; OXIDATION REDUCTION REACTION; THERMODYNAMICS;

EID: 0030772943     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9716315     Document Type: Article

References (36)

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