Study of decomposition of sulphur hexafluoride by gas chromatography/mass spectrometry

Rapid Communications in Mass Spectrometry

Volumn 11, Issue 15, 1997, Pages 1643-1648

  Kóréh, Orsolya ^a   Rikker, Tamás ^a   Molnár, Gábor ^a   Mahara, Bashir Mohamed ^a   Torkos, Kornél ^a   Borossay, József ^a  

^a EÖTVÖS LORÁND UNIVERSITY   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

GAS CHROMATOGRAPHY;

ANALYTICAL METHOD; DECOMPOSITION PRODUCTS; ELECTRICAL DISCHARGES; GASCHROMATOGRAPHY-MASS SPECTROMETRY; INDIVIDUAL COMPONENTS; INPUT ENERGY; MODEL EXPERIMENTS; OXYFLUORIDES; REACTION CONDITIONS; REACTION ROUTES;

SULFUR HEXAFLUORIDE;

EID: 0030766202     PISSN: 09514198     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-0231(19971015)11:15<1643::AID-RCM14>3.0.CO;2-C     Document Type: Article

References (17)

1. G. Mauthke and K. Pettersson, Électra 136, 69 (1991).
2. J. M. Braun, F. Y. Chu and R. Seethapathy, IEEE Trans. El. Ins. 2, 187 (1987).
3. A. Derdouri, J. Casanovas, R. Grob and J. Mathieu, IEEE Trans. El. Ins. 24, 1147 (1989).
4. L. Niemeyer and F. Y. Chu, IEEE Trans. El. Ins. 27, 184 (1992).
5. G. D. Griffin, I. Sauers, K. Kurka and C. E. Easterly, IEEE Trans. Power Delivery 4, 1541 (1989).
6. F. Y. Chu, IEEE Trans. El. Ins. 5, 693 (1986).
7. K. R. Ryan and I. C. Plumb, Plasma Chem. Plasma Processes 8, 263 (1988).
8. I. Sauers, Plasma Chem. Plasma Processes 8, 247 (1988).
9. K. R. Ryan, Plasma Chem. Plasma Processes 9, 483 (1989).
10. C. Boudéne and J. Cluet, RGE, 45 (1974).
11. T. Rikker, K. Torkos and J. Borossay, ACH-Models in Chem. 132, 395 (1995).
12. I. Sauers, P. C. Votaw and G. D. Griffin, J. Phys. D: Appl. Phys. 21, 1236 (1988).
13. J. K. Olthoff, R. J. Van Brunt and I. Sauers, J. Phys. D: Appl. Phys. 22, 1399 (1989).
14. B. Belmadani, J. Casanovas and A. M. Casanovas, IEEE Trans. El. Ins. 26, 1177 (1991).
15. R. J. Van Brunt, L. W. Sieck, I. Sauers and M. C. Siddagangappa, Plasma Chem. Plasma Processes 8, 225 (1988).
16. R. J. Van Brunt and I. Sauers, J. Chem. Phys. 85, 4377 (1986).
17. R. J. Van Brunt and M. C. Siddagangappa, Plasma Chem. Plasma Process. 8, 207 (1988).