Inhomogeneities in PECVD deposited a-Si:H films induced by a spacing between substrate and substrate holder

Solar Energy Materials and Solar Cells

Volumn 45, Issue 1, 1997, Pages 57-63

  Van Sark, W G J H M ^a,b   Meiling, H ^a   Bezemer, J ^a   Von Der Linden, M B ^a   Schropp, R E I ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

Author keywords

a Si:H films; Deposition rate; Spacing

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRODES; SEMICONDUCTING GLASS; SEMICONDUCTOR DEVICE MODELS; SILICON SOLAR CELLS; SUBSTRATES;

DEPOSITION RATE REDUCTION; GLASS SUBSTRATE; PLASMA DEPOSITION; PLASMA RECTOR SYSTEM;

SEMICONDUCTING FILMS;

EID: 0030737455     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(96)00062-1     Document Type: Article

References (18)

1. R.A. Street, Hydrogenated Amorphous Silicon (Cambridge University Press, Cambridge, 1991).
2. W. Luft and Y.S. Tsuo, Hydrogenated Amorphous Silicon Alloy Deposition Processes (Marcel Dekker, NY, 1993).
3. G. Bruno, P. Capezzuto and A. Madan (Eds.), Plasma Deposition of Amorphous Silicon-Based Materials (Academic Press, Boston, MA, 1995).
4. A. Shah, J. Dutta, N. Wyrsch, K. Prasad, H. Curtins, F. Finger, A. Howling and C. Hollenstein, in: M.J. Thompson, P.G. LeComber, Y. Hamakawa, A. Madan and E.A. Schiff (Eds.), Amorphous Silicon Technology 1992 (Materials Research Society, Pittsburgh, PA, 1992) p. 15.
5. W.G.J.H.M. van Sark, J. Bezemer, E.M.B. Heller, M. Kars and W.F. van der Weg, in: M. Hack, E.A. Schiff, A. Madan, M. Powell and A. Matsuda (Eds.), Amorphous Silicon Technology 1995 (Materials Research Society, Pittsburgh, PA, 1995), p. 3.
6. H. Chatham and P.K. Bhat, Mater. Res. Soc. Symp. Proc. 149 (1989) 447. In: A. Madan, M.J. Thompson, P.C. Taylor, Y. Hamakawa and P.G. LeComber (eds.), Amorphous Silicon Technology, 1989 (Materials Research Society, Pittsburgh, PA, 1989) 447.
7. H. Chatham and P.K. Bhat, Mater. Res. Soc. Symp. Proc. 149 (1989) 447. In: A. Madan, M.J. Thompson, P.C. Taylor, Y. Hamakawa and P.G. LeComber (eds.), Amorphous Silicon Technology, 1989 (Materials Research Society, Pittsburgh, PA, 1989) 447.
8. W.G.J.H.M. van Sark, J. Bezemer, R. van der Heijden and W.F. van der Weg, in: M. Hack, E.A. Schiff, S. Wagner, A. Matsuda and R. Schropp (Eds.), Amorphous Silicon Technology 1996 (Materials Research Society, Pittsburgh, PA, in press).
9. S. Röhlecke, R. Tews, A. Kottwitz and K. Schade, Surf. Coat. Technol. 74-75 (1995) 259.
10. J. Kuske, U. Stephan, O. Steinke and S. Röhlecke, in: M. Hack, E.A. Schiff, A. Madan, M. Powell and A. Matsuda (Eds.), Amorphous Silicon Technology 1995 (Materials Research Society, Pittsburgh, PA, 1995), p. 27.
11. C. Ossadnik, W. Frammelsberger, W. Psyk, P. Lechner, H. Rübel and H. Schade, in: Proc. 13th European Photovoltaic Solar Energy Conf., Nice, 1995, p. 210.
12. C.A.M. Stap, H. Meiling, G. Landweer, J. Bezemer and W.F. van der Weg, in: Proc. 9th EC Photovoltaic Solar Energy Conf., Freiburg, 1989, p. 74.
13. Corning 7059 Material Information, Corning Glass Works, NY.
14. H. Meiling, W.G.J.H.M. van Sark, J. Bezemer and W. van der Weg, J. Appl. Phys. 80 (1996) 3546.
15. U. Kroll, Y. Ziegler, J. Meier, H. Keppner and A. Shah, in: E.A. Schiff, M. Hack, A. Madan, M. Powell, and A. Matsuda (eds.), Amorphous Silicon Technology 1994 (Materials Research Society, Pittsburgh, PA, 1994) 115.
16. C. Beneking, F. Finger and H. Wagner, in: Proc. 11th European Photovoltaic Solar Energy Conf., Montreux, 1993, p. 586.
17. G. Ganguly and A. Matsuda, J. Non-Cryst. Solids 164-166 (1993) 31.
18. D.A.G. Bruggeman, Ann. Phys. (Leipzig) 24 (1935) 636.