Characteristics of sheath instability in a double plasma device

Physics of Plasmas

Volumn 4, Issue 1, 1997, Pages 61-68

  Sarma, A ^a   Bailung, H ^a   Chutia, Joyanti ^a  

^a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; FREQUENCIES; ION BEAMS; PLASMA DENSITY; PLASMA STABILITY; PROBES; RESONANCE;

ENERGY ANALYZER; ION RICH SHEATH; LANGMUIR PROBE; PLASMA POTENTIAL; SHEATH INSTABILITY;

PLASMA SHEATHS;

EID: 0030736959     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.872111     Document Type: Article

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