-
2
-
-
0017911577
-
Process testing for reliability control
-
W. H. Schroen, Process testing for reliability control, Proc. IRPS, 81-87 (1978).
-
(1978)
Proc. IRPS
, pp. 81-87
-
-
Schroen, W.H.1
-
3
-
-
0042653660
-
-
note
-
Initiated in 1982 by O. D. Trapp, of Technology Associates, with initial support of the Defense Advanced Research Projects Agency. IEEE sponsorship began in 1992 and the name was changed in 1993 to the Integrated Reliability Workshop.
-
-
-
-
4
-
-
0042653661
-
-
note
-
Committee JC-14.2 on Wafer Level Reliability of JEDEC (Joint Electron Device Engineering Council). JEDEC performs engineering activities for solid state products in the Electronic Industries Association.
-
-
-
-
5
-
-
0024641161
-
Reliability predictions for integrated circuits from test structure data
-
W. G. Kleppmann, Reliability predictions for integrated circuits from test structure data, Quality & Reliability Engineering International 5, 155-163 (1989).
-
(1989)
Quality & Reliability Engineering International
, vol.5
, pp. 155-163
-
-
Kleppmann, W.G.1
-
6
-
-
0041651622
-
Reliability predictions for ICs from test structure data
-
W. G. Kleppmann, Reliability predictions for ICs from test structure data, WLR Workshop Final Report, 125-135 (1989).
-
(1989)
WLR Workshop Final Report
, pp. 125-135
-
-
Kleppmann, W.G.1
-
7
-
-
0043154512
-
Pentium power
-
M. Feibus and M. Slater, Pentium power, PC Magazine 12, no. 8, 108-120 (1993).
-
(1993)
PC Magazine
, vol.12
, Issue.8
, pp. 108-120
-
-
Feibus, M.1
Slater, M.2
-
9
-
-
0004143430
-
-
John Wiley & Sons, Inc., New York
-
W. Nelson, Applied Life Data Analysis, pp. 320-321. John Wiley & Sons, Inc., New York (1982).
-
(1982)
Applied Life Data Analysis
, pp. 320-321
-
-
Nelson, W.1
-
10
-
-
0003682285
-
-
John Wiley & Sons, New York
-
W. Nelson, Accelerated Testing: Statistical Models, Test Plans, and Data Analysis, p. 248. John Wiley & Sons, New York (1990).
-
(1990)
Accelerated Testing: Statistical Models, Test Plans, and Data Analysis
, pp. 248
-
-
Nelson, W.1
-
12
-
-
0042152554
-
Making reliability estimates when zero failures are seen in laboratory aging
-
F. R. Nash, Making reliability estimates when zero failures are seen in laboratory aging, Mat. Res. Soc. Symp. Proc. 184, 3-21 (1990).
-
(1990)
Mat. Res. Soc. Symp. Proc.
, vol.184
, pp. 3-21
-
-
Nash, F.R.1
-
13
-
-
0025661855
-
Evolution of VLSI reliability engineering
-
D. L. Crook, Evolution of VLSI reliability engineering, Proc. IRPS, 2-11 (1990).
-
(1990)
Proc. IRPS
, pp. 2-11
-
-
Crook, D.L.1
-
17
-
-
0029277110
-
A systematic approach to wafer level reliability
-
March
-
J. Shideler, T. Turner, and J. Reedholm, A systematic approach to wafer level reliability, Solid State Technology 38, 47-51, March (1995).
-
(1995)
Solid State Technology
, vol.38
, pp. 47-51
-
-
Shideler, J.1
Turner, T.2
Reedholm, J.3
-
18
-
-
0041651680
-
Application of CMOS-compatible micro-hotplates for in-situ process monitors
-
J. S. Suehle and M. Gaitan, Application of CMOS-compatible micro-hotplates for in-situ process monitors, Wafer Level Reliability Workshop Final Report, 122-132 (1992).
-
(1992)
Wafer Level Reliability Workshop Final Report
, pp. 122-132
-
-
Suehle, J.S.1
Gaitan, M.2
-
19
-
-
0043154513
-
PVD on-line process control through in situ monitoring
-
Nov.
-
W. E. Frank, I. Ruge, P. Kücher, and H. Helneder, PVD on-line process control through in situ monitoring, Semiconductor International 15, 60-66 Nov. (1992).
-
(1992)
Semiconductor International
, vol.15
, pp. 60-66
-
-
Frank, W.E.1
Ruge, I.2
Kücher, P.3
Helneder, H.4
-
20
-
-
0042152555
-
High reliability Al electrode formation technology
-
Dec. 3
-
F. Yanagawa, High reliability Al electrode formation technology, Semiconductor World 10, 206-210 Dec. 3 (1990).
-
(1990)
Semiconductor World
, vol.10
, pp. 206-210
-
-
Yanagawa, F.1
-
21
-
-
0043154516
-
-
Intel, Santa Clara, CA, private communication
-
Donald Gardner, Intel, Santa Clara, CA, private communication.
-
-
-
Gardner, D.1
-
22
-
-
0026141273
-
Failure rate model for thin film cracking in plastic IC's
-
R. C. Blish, II and P. R. Vaney, Failure rate model for thin film cracking in plastic IC's, Proc. IRPS, 22-29 (1991).
-
(1991)
Proc. IRPS
, pp. 22-29
-
-
Blish R.C. II1
Vaney, P.R.2
-
23
-
-
0043154511
-
Real-time spectral ellipsometry applied to semiconductor thin film diagnostics
-
Jan. 30 to Feb. 2, 1995, NIST, Gaithersburg, MD, U.S.A., to be published in the Fall of
-
W. M. Duncan, M. J. Bevan, and S. A. Henck, Real-time spectral ellipsometry applied to semiconductor thin film diagnostics, Proc. International Workshop on Semiconductor Characterization: Present Status and Future Needs, Jan. 30 to Feb. 2, 1995, NIST, Gaithersburg, MD, U.S.A., to be published in the Fall of 1995.
-
(1995)
Proc. International Workshop on Semiconductor Characterization: Present Status and Future Needs
-
-
Duncan, W.M.1
Bevan, M.J.2
Henck, S.A.3
-
24
-
-
0041651679
-
Real-time measurement of film thickness, composition, and temperature by FT-IR emission and reflection spectroscopy
-
P. R. Solomon, S. Liu, P. A. Rosenthal, and S. Farquharson, Real-time measurement of film thickness, composition, and temperature by FT-IR emission and reflection spectroscopy, ibid.
-
Proc. International Workshop on Semiconductor Characterization: Present Status and Future Needs
-
-
Solomon, P.R.1
Liu, S.2
Rosenthal, P.A.3
Farquharson, S.4
-
26
-
-
0029346110
-
A new technique for solving wafer charging problems
-
July
-
J. Shideler, S. Reno, R. Bammi, C. Messick, A. Cowley, and W. Lukaszek, A new technique for solving wafer charging problems, Semiconductor International 18, 153-158, July (1995).
-
(1995)
Semiconductor International
, vol.18
, pp. 153-158
-
-
Shideler, J.1
Reno, S.2
Bammi, R.3
Messick, C.4
Cowley, A.5
Lukaszek, W.6
-
27
-
-
0343427533
-
EEPROM-based charging-effects sensors for plasma etching and ion implantation
-
W. Lukaszek, EEPROM-based charging-effects sensors for plasma etching and ion implantation, Wafer Level Reliability Workshop Final Report, 101-105 (1992).
-
(1992)
Wafer Level Reliability Workshop Final Report
, pp. 101-105
-
-
Lukaszek, W.1
-
28
-
-
40849131013
-
Charging studies using the CHARM-2 wafer surface charging monitor
-
W. Lukaszek, W. Dixon, E. Quek, W. Weisenberger, and S. Ho, Charging studies using the CHARM-2 wafer surface charging monitor, Nucl. Instr. and Meth. B74, 301-305 (1993).
-
(1993)
Nucl. Instr. and Meth.
, vol.B74
, pp. 301-305
-
-
Lukaszek, W.1
Dixon, W.2
Quek, E.3
Weisenberger, W.4
Ho, S.5
-
29
-
-
0028257886
-
Characterization of wafer charging mechanisms and oxide survival prediction methodology
-
W. Lukaszek, W. Dixon, M. Vella, C. Messick, S. Reno, and J. Shideler, Characterization of wafer charging mechanisms and oxide survival prediction methodology, Proc. IRPS, 334-338 (1994).
-
(1994)
Proc. IRPS
, pp. 334-338
-
-
Lukaszek, W.1
Dixon, W.2
Vella, M.3
Messick, C.4
Reno, S.5
Shideler, J.6
-
30
-
-
0042152514
-
Application of CHARM-2 wafers as a tool to improve wafer yield and reliability
-
to be published
-
R. Bammi and S. Reno, Application of CHARM-2 wafers as a tool to improve wafer yield and reliability, Integrated Reliability Workshop Final Report (1995) to be published.
-
(1995)
Integrated Reliability Workshop Final Report
-
-
Bammi, R.1
Reno, S.2
-
31
-
-
0042152556
-
-
National Semiconductor, West Jordan, UT, private communication
-
Cleston Messick, National Semiconductor, West Jordan, UT, private communication.
-
-
-
Messick, C.1
-
32
-
-
0002279322
-
The unconventional nature of particles
-
March
-
G. S. Selwyn, The unconventional nature of particles, Semiconductor International 16, 72-78, March 1993.
-
(1993)
Semiconductor International
, vol.16
, pp. 72-78
-
-
Selwyn, G.S.1
-
33
-
-
0002119976
-
Dusty Plasmas
-
Aug.
-
A. Bouchoule, Dusty Plasmas, Physics World 6, 47-51 Aug. (1993).
-
(1993)
Physics World
, vol.6
, pp. 47-51
-
-
Bouchoule, A.1
-
34
-
-
21544481296
-
Particle trapping phenomena in radio frequency plasmas
-
29 Oct.
-
G. S. Selwyn, J. E. Heidenreich, and K. L. Haller, Particle trapping phenomena in radio frequency plasmas. Appl. Phys. Lett. 57, 1876-1878, 29 Oct. (1990).
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 1876-1878
-
-
Selwyn, G.S.1
Heidenreich, J.E.2
Haller, K.L.3
-
35
-
-
33646175630
-
In situ laser diagnostic studies of plasma-generated particulate contamination
-
Jul./Aug.
-
G. S. Selwyn, In situ laser diagnostic studies of plasma-generated particulate contamination, J. Vac. Sci. Technol. A 7(4), 2758-2765 Jul./Aug. (1989).
-
(1989)
J. Vac. Sci. Technol. A
, vol.7
, Issue.4
, pp. 2758-2765
-
-
Selwyn, G.S.1
-
36
-
-
0001028408
-
Plasma particulate contamination control. I. transport and process effects
-
Nov./Dec.
-
G. S. Selwyn, Plasma particulate contamination control. I. transport and process effects, J. Vac. Sci. Technol. B 9(6), 3487-3492, Nov./Dec. (1991).
-
(1991)
J. Vac. Sci. Technol. B
, vol.9
, Issue.6
, pp. 3487-3492
-
-
Selwyn, G.S.1
-
37
-
-
84908774877
-
Plasma particulate contamination control. II. self-cleaning tool design
-
Jul./Aug.
-
G. S. Selwyn, Plasma particulate contamination control. II. self-cleaning tool design, J. Vac. Sci. Technol. A 10(4), 1053-1059, Jul./Aug. (1992).
-
(1992)
J. Vac. Sci. Technol. A
, vol.10
, Issue.4
, pp. 1053-1059
-
-
Selwyn, G.S.1
|