New evaluation technique of plasma-induced Si substrate damage by photoreflectance spectroscopy

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 215-218

  Eriguchi, Koji ^a   Imai, Takaaki ^a   Asai, Akira ^a   Okuyama, Masanori ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; DIFFUSION IN SOLIDS; OXYGEN; PHOTONS; RAMAN SPECTROSCOPY; REFLECTOMETERS; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS; SUBSTRATES; SURFACE PHENOMENA;

PHOTOREFLECTANCE SPECTROSCOPY; PLASMA INDUCED SILICON SUBSTRATE DAMAGE;

REACTIVE ION ETCHING;

EID: 0030717031     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)