Formation of a positive photoresist thin film by spin coating: Influence of atmospheric temperature

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 1 A, 1997, Pages 372-377

  Yada, Toshio ^a   Aoki, Masaru ^b   Maejima, Taro ^b   Ishizu, Akira ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b Advanced Display Incorporated   (Japan)

Author keywords

Atmospheric temperature; Evaporation; Film formation; Outflow; Positive photoresist; Spin coating; Spin speed

Indexed keywords

POSITIVE PHOTORESIST THIN FILMS; SPIN COATING;

ATMOSPHERIC TEMPERATURE; EVAPORATION; FILM GROWTH; NON NEWTONIAN FLOW; SOLVENTS; THERMAL EFFECTS; THIN FILMS; VISCOSITY;

PHOTORESISTS;

EID: 0030716981     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.36.372     Document Type: Article

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