Fabrication of 5 nm resolution electrodes for molecular devices by means of electron beam lithography

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 1 PART A/B, 1997, Pages

  Di Fabrizio, Enzo ^a   Grella, Luca ^a   Gentili, Massimo ^a   Baciocchi, Marco ^a   Mastrogiacomo, Luigi ^a   Morales, Piero ^b  

^a Ist Electronica Dello Stato S   (Italy)

^b ENEA   (Italy)

Author keywords

Electron beam lithography; High aspect ratio; Molecular device; PMMA; Rectifier; Resist adhesion

Indexed keywords

ASPECT RATIO; ELECTRIC RECTIFIERS; ELECTRON BEAM LITHOGRAPHY; POLYMETHYL METHACRYLATES;

MOLECULAR DEVICE;

ELECTRODES;

EID: 0030716536     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l70     Document Type: Article

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