Characterization of PECVD deposited fluorosilicate glass (FSG) after CMP and cleaning

Materials Research Society Symposium - Proceedings

Volumn 443, Issue , 1997, Pages 127-135

  Mordo, D ^a   Goswami, I ^a   Malik, I J ^a   Mallon, T ^a   Emami, R ^a   Withers, B ^a  

^a NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; CLEANING; COMPOSITION EFFECTS; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; PLASMA APPLICATIONS; REFRACTIVE INDEX; SILICATES; SURFACE ROUGHNESS;

FLUOROSILICATE GLASS; INTERMETAL DIELECTRICS; MECHANICAL POLISHING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); THERMAL DESORPTION SPECTROSCOPY (TDS);

DIELECTRIC FILMS;

EID: 0030716048     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)