Simple sub-0.3 μm CMOS technology with five-level interconnect using Al-plug and HSQ of low-k for high performance processor

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1997, Pages 55-56

  Yoshiyama, K ^a   Okada, K ^a   Igarashi, M ^a   Yamada, K ^a   Shimizu, S ^a   Takata, Y ^a   Osaki, A ^a   Higashitani, K ^a   Asai, S ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; HYDROGEN INORGANIC COMPOUNDS; MICROPROCESSOR CHIPS; TRANSISTORS;

HYDROGEN SILSESQUIOXANE (HSQ); MULTIMEDIA PROCESSORS;

CMOS INTEGRATED CIRCUITS;

EID: 0030715834     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)