New diffusion algorithm during oxidation which can handle both phosphorus pile-up and boron segregation at Si-SiO2 interface

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn , Issue , 1997, Pages 81-86

  Sakamoto, Hironori ^a   Kumashiro, Shigetaka ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFUSION; INTERFACES (MATERIALS); OXIDATION; PHOSPHORUS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SILICA;

BORON SEGREGATION; PHOSPHORUS PILE UP; TRANSITION LAYER;

MOSFET DEVICES;

EID: 0030715815     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)