Novel MOCVD processes for nanoscale oxide thin films

Materials Research Society Symposium - Proceedings

Volumn 446, Issue , 1997, Pages 315-320

  Li, Tingkai ^a   Zawadzki, Pete ^a   Stall, Richard A ^a   Zhu, Yongfei ^a   Desu, Seshu B ^a  

^a EMCORE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRICITY; INTERFACES (MATERIALS); LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PLASMA APPLICATIONS; SURFACE ROUGHNESS; THERMAL EFFECTS; TITANIUM OXIDES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

THIN FILMS;

EID: 0030715495     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)