Use of metal additions to phosphoric acid to etch polysilicon in poly buffered LOCOS processes

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 459-464

  Pearce, Charles W ^a   Chung, B C ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COPPER; ETCHING; IRON; PHOSPHORIC ACID; POLYCRYSTALLINE MATERIALS; REDOX REACTIONS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE;

LOCAL OXIDATION OF SILICON (LOCOS);

SEMICONDUCTING SILICON;

EID: 0030715186     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)